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JAN 2013: Pulsed Laser Deposition and Sputtering

JAN 2013: Pulsed Laser Deposition and Sputtering

News 24 January 2013 10971 hits jags

Barcelona, Jan 24-25, 2013

PLD has become the leading technique for deposition of complex oxides, whereas sputtering is a standard technique for preparation of metal and oxide films, either in research laboratories and industry.Nowadays, these techniques allow fabrication of oxide and metal thin films and heterostructures with atomic quality control. 

In the Meeting on Pulsed Laser Deposition and Sputtering, several tutorials will review the basics of these techniques and will present the new facilities and capabilities of the Thin Films Laboratory at ICMAB.

There will be also a Session with contributed talks on thin film growth by PLD and sputtering (with focus on growth phenomena and influence of deposition conditions).

The Meeting will include observation of real experiments of thin film deposition and RHEED analysis.

DOWNLOAD: icon Pulsed Laser Deposition and Sputtering (1.72 MB)



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